Key Technological Applications of High-Purity Boron Oxide in Photoelectric Display Substrate Glass

Introduction: The Evolution of Display Technology Places Higher Demands on Base Materials

With the rapid development of new display technologies like OLED, Mini/Micro-LED, and flexible displays, consumers are demanding higher standards for screen clarity, color accuracy, response speed, and durability. As the “foundation” of display panels, the performance of substrate glass directly determines the reliability and yield of the entire display device. Behind the scenes, high-purity boron oxide (B₂O₃) is playing an increasingly vital role as a key component in glass formulations.

Traditional soda-lime glass, with its high thermal expansion coefficient and poor chemical stability, can no longer meet the demands of high-end displays. It is being replaced by high-performance glass systems, such as borosilicate glass. This type of glass offers advantages like low thermal expansion, high chemical stability, and excellent electrical insulation, making it widely used in G6, G8.5, and even G10.5 generation OLED/LCD panel production lines. Boron oxide is one of the core network formers in this class of glass.

The Mechanism of Boron Oxide in Glass Structure

Acting as a Network Former to Optimize Glass Structure

In the amorphous structure of glass, boron oxide (B₂O₃) primarily forms a two-dimensional network structure with [BO₃] triangular planar units. This effectively lowers the glass’s softening point and melting temperature, while improving melt fluidity. This characteristic is crucial for large-scale glass melting processes, as it significantly reduces energy consumption and enhances production efficiency.

Furthermore, the introduction of boron oxide increases the density of the glass network and reduces free volume, thereby improving the glass’s mechanical strength and chemical durability. For display substrates that must undergo multiple high-temperature annealing, thin-film deposition, and etching processes, this translates to a wider process window and a lower defect rate.

Regulating Thermal Expansion Coefficient to Ensure Dimensional Stability

During OLED panel manufacturing, substrate glass must endure the deposition and annealing of TFT (Thin-Film Transistor) arrays at high temperatures exceeding 300°C. If the glass has a high thermal expansion coefficient, it is highly susceptible to warping, cracking, or pixel misalignment due to thermal stress, severely impacting production yield.

The addition of boron oxide significantly reduces the glass’s coefficient of thermal expansion (CTE), allowing it to maintain dimensional stability at high temperatures. For example, in typical borosilicate glass, for every 5% increase in B₂O₃ content, the CTE can be reduced by approximately 10–15×10⁻⁷/°C. This is critical for achieving ultra-thin, flexible, and high-resolution display technologies.

Enhancing Optical Homogeneity and Reducing Visual Defects

High-purity boron oxide also improves the optical homogeneity of glass, reducing macroscopic defects such as striae, bubbles, and stones. In high-resolution displays, these defects can cause “Mura” (uneven brightness), severely affecting the visual experience. By controlling the purity and particle size distribution of the boron oxide, rapid and uniform dissolution in the glass melt is ensured, thereby improving melting quality.

High Purity is Key to Performance Assurance

The Detrimental Impact of Metal Impurities Cannot Be Overlooked

Boron oxide used in photoelectric displays must achieve electronic grade purity. The presence of metal impurities such as Fe, Na, K, and Ca can cause serious issues:

• Fe₂O₃: Absorbs visible light, reducing transmittance and affecting display brightness.
• Na₂O: As a mobile ion, it can increase leakage current in TFT devices, impacting their lifespan.
• Heavy metal impurities: Can introduce charge traps, affecting electron mobility.

Therefore, the impurity control standards for high-purity boron oxide are extremely stringent, typically requiring Fe ≤ 50ppm, Na ≤ 200ppm, and total metal impurities controlled below 1000ppm.

The Technical Advantages of Youbor New Materials

Youbor New Materials (Xi’an) Co., Ltd. specializes in the R&D and production of high-purity boron materials, with a product line covering electronic grade boron oxide, industrial grade boron oxide, boric acid, borax, and more.

Our electronic grade boron oxide products offer the following advantages:

• High Purity: B₂O₃ ≥ 99.0%, conforming to enterprise standard Q/TY-J08.04-2010.
• Low Impurities: Fe₂O₃ ≤ 50ppm, Na₂O ≤ 200ppm, meeting the requirements of high-end glass manufacturers.
• Controllable Particle Size: Available in various specifications such as 60 mesh, 100 mesh, 200 mesh, and 325 mesh to suit different furnace processes.
• Standardized Packaging: Vacuum-packed using double-layer PE bags + iron drums/paper drums to prevent moisture absorption and contamination.

Our production process utilizes fully enclosed airflow crushing and automated packaging systems to ensure consistency and stability across every batch.

Application Cases and Customer Feedback

Currently, Youbor New Materials’ high-purity boron oxide has been successfully applied in the substrate glass formulations of several domestic electronic glass companies, serving customers in fields such as OLED panels, cover glass, and ampoules.

Feedback from a renowned domestic electronic glass company:

• “Since adopting Youbor’s electronic grade boron oxide, we have seen a significant improvement in glass melting homogeneity, a more than 15% reduction in bubble rate, and a marked enhancement in batch stability, effectively supporting the stable mass production of our G8.5 generation line.”

Additionally, we provide customers with technical consulting services to assist in optimizing formulations and process parameters, helping them improve product yield and competitiveness.

Future Outlook: Supporting the Development of Next-Generation Display Technologies

With the emergence of cutting-edge technologies like Micro-OLED, transparent displays, stretchable electronics, and AR/VR near-eye displays, the requirements for substrate materials will become even more demanding. In the future, boron oxide will not only need higher purity but may also take on more functional roles, such as:

• Serving as a doping carrier to introduce other functional elements.
• Participating in the construction of new glass-ceramic composite materials.
• Supporting the low-temperature forming processes of Ultra-Thin Glass (UTG).

Youbor New Materials will continue to invest in R&D to develop boron oxide products with higher purity, lower impurities, and optimized particle size distribution. We will actively participate in the formulation of industry technical standards, providing solid material support for innovation and import substitution within the display industry.

Conclusion:
Behind the scenes of display technology lies the precise collaboration of countless fundamental materials. Youbor New Materials is committed to illuminating the future of China’s “screen” industry with a high-purity core.